Feature-oriented scanning (FOS)[1][2] is a method intended for high-precision measurement of nanotopography as well as other surface properties and characteristics on a scanning probe microscope (SPM) using features (objects) of the surface as reference points of the microscope probe. FOS method implies that during successive passings from one surface feature to another one located nearby, being measured are the relative distance between the features and the topography of their neighborhoods — segments. Such approach permits to scan out the required area of the surface by parts and then reconstruct the whole image by the obtained fragments. Beside the mentioned, it is acceptable to use another name for the method — object-oriented scanning (OOS).
References
- ^ R. V. Lapshin, “Feature-oriented scanning methodology for probe microscopy and nanotechnology”, Nanotechnology, volume 15, issue 9, pages 1135-1151, 2004.
- ^ R. V. Lapshin, “Automatic drift elimination in probe microscope images based on techniques of counter-scanning and topography feature recognition”, Measurement Science and Technology, volume 18, issue 3, pages 907-927, 2007.
External links
- Feature-oriented scanning, Research section at Lapshin's Personal Page on SPM & Nanotechnology
|
|
||
|---|---|---|
| Common microscopes |
 |
|
| Other microscopes |
Electrostatic force microscope · Electrochemical scanning tunneling microscope · Kelvin probe force microscope · Magnetic force microscope · Magnetic resonance force microscopy · Near-field scanning optical microscope · Photothermal microspectroscopy · Scanning capacitance microscopy · Scanning gate microscopy · Scanning Hall probe microscope · Scanning ion-conductance microscopy · Spin polarized scanning tunneling microscopy · Scanning voltage microscopy |
|
| Applications |
Scanning probe lithography · Dip-Pen Nanolithography · Feature-oriented scanning · IBM Millipede |
|
| See also | ||
